Russian Nanotech Center Develops 150nm Electron Beam Lithography System for Legacy Chip Production

• July 20, 2026

The Zelenograd Nanotechnology Center (ZNTC) in Russia has developed a new electron beam lithography (EBL) system designed for semiconductor manufacturing at the 150 nanometer scale. This breakthrough aims to support chip production consistent with technologies from the era of Pentium 4 processors, enabling maskless patterning on substrates.

Advancing Lithography Capabilities for Older Chip Technologies

According to recently obtained documents, the ZNTC is preparing to transport a prototype of its electron beam lithography device, which operates under project standards defined for the 150 nm process node. This system allows the creation of photomasks and direct pattern formation on semiconductor substrates without requiring traditional mask usage.

Electron beam lithography is known for its precision in drawing very fine patterns by using a focused beam of electrons instead of light. While current industry-leading semiconductor fabrication often revolves around much finer process nodes, the 150 nm scale remains relevant for research, legacy device production, and specialized applications.

The system developed by ZNTC is part of a larger research and development initiative titled “Progress EBL 150,” aimed at advancing Russia’s domestic capabilities in semiconductor fabrication technology. As global semiconductor demand continues to diversify across various nodes, such infrastructure plays an important role in maintaining supply chains for older-generation chips that remain in use in a variety of industrial and legacy computing environments.

Although no specific timeline, pricing details, or performance benchmarks were disclosed, this development signals a notable effort toward increasing autarky and innovation within Russia’s microfabrication sector. The focus on 150 nm technology aligns with chips produced during the Pentium 4 processor era, which marked a significant period in consumer and enterprise computing history.

Given ongoing global chip shortages and shifting market demands, enhanced lithography solutions for legacy semiconductor nodes may find continued relevance. By enabling maskless lithography at this scale, the ZNTC’s system could offer increased flexibility, faster prototyping, and cost efficiencies compared to traditional photomask-dependent methods.

Further details regarding the capabilities and future applications of this electron beam lithography technology are expected as the prototype advances through its testing and refinement phases.

Zelenograd Nanotech Center creates a 150nm electron beam lithography device aimed at maskless chip patterning, suitable for Pentium 4 generation technology.